09/Oct/2017 | 8486209009 | Machines for the production of electronic integrated circuits centrifuges polos. designed for application and manifestations photoresist zhidkostnogo pickling, drying, washing and cleaning substrate. not for military purposes. is not ree and hfd. | GERMANY | APT | 1 | PC | 101 | 37340,63 | ***** | 84 More Columns Available along with Company Name and Other Details etc. |
28/Sep/2017 | 8486209009 | Machines and apparatus for dry etching pattern onto a semiconductor material. not pec art without yavl sources of ionizing radiation, not color ferrous and metal, contact with food food and water pievoy, cet appointed not subject own intelligence. setting | UNITED KINGDOM | *** | 1,013 | KG | 1,013 | 423036,09 | ***** |
20/Sep/2017 | 8486209009 | Installation plasma etching inductively coupled plasma art: corial 210il intended: for etching different layers on semiconductor wafers. plasma etching - a technology and dry etching is used to remove a portion of f | FRANCE | *** | 940 | KG | 940 | 450783,52 | ***** |
12/Sep/2017 | 8486209009 | Machines for the production of electronic integrated circuits centrifuges polos. designed for application and manifestations photoresist, wet etching, drying, washing and cleaning substrate. not for military purposes. is not ree and hfd. operating voltage | GERMANY | *** | 35,7 | KG | 35.70 | 13361,79 | ***** |