09/Oct/2017 | 8486909008 | System of pulse lazernogo thin film deposition mod.plad-6000s, the warranty supplied replace the failed one. for their own use. | JAPAN | ABSENT | *** | *** | 12.02 | 3182,61 | ***** | 84 More Columns Available along with Company Name and Other Details etc. |
05/Oct/2017 | 8486209009 | Installation mocvd poluprovodnikovyh compounds ccs 3x2 "(1x4") - 1 pc. purpose: the unit is designed to obtain semiconducting epitaxial heterostructures (a plate with the deposited film compound semiconductor | UNITED KINGDOM | ABSENT | 1 | PC | 2,708.80 | 2480063,6 | ***** |
03/Oct/2017 | 8486902000 | Capacity for solution deionized water .yavlyaetsya only part of the installation depositing a dielectric layers for maintaining technical parameters deionized water in the system application photographic emulsion on the substrate | UNITED STATES | APPLIED | *** | *** | 33 | 34075,14 | ***** |
28/Sep/2017 | 8486909008 | Furnace for installation of deposition of dielectric layer based on oven tel a-8se (fv11 / m00009955056), not a high-frequency devices: heating unit assembly with upper ceramic blocks (.. art ds1110-221701-11 - 1 pcs) mounted in iu | KOREA REPUBLIC OF | *** | 150 | KG | 150 | 18411,25 | ***** |
27/Sep/2017 | 8486909008 | Of apparatus for manufacturing semiconductor devices: basic, container, the cations of the electrolyte membrane as a funnel 200mm (oem new), use of the unit electrochemical deposition of copper sabre next system, diameter: 200mm, thickness 5 | TAIWAN CHINA | *** | 81 | KG | 81 | 21627,87 | ***** |
20/Sep/2017 | 8486209009 | System pecvd dielectrics art: corial d250 system designed pecvd for the deposition of the dielectric, pecvd process - pecvd dielectric of the gas phase. scope: for use | FRANCE | *** | 740 | KG | 740 | 341216,32 | ***** |